SPIE Optical Engineering + Applications

This major symposium covers classical optical R & D, design, and engineering, as well as technologies and systems for use in optical systems, remote sensing, and illumination engineering. Events of interest to synchrotron scientists include the following two conferences.

Advances in X-Ray/EUV Optics and Components V (OP321)

Advances and emerging needs in x-ray and EUV sources, optics, and applications including next-generation synchrotron and free-electron laser sources, EUV photolithography, and x-ray astronomy.

Developments in X-Ray Tomography VII (OP323)

Interdisciplinary discussion of tomography. Scientists and engineers from medicine, biology, earth science, materials testing and development, crystallography, solid state physics, chemistry, micro-mechanics, and micro-devices will present their results and describe new strategies and components for tomography as well as new applications.

Deadline for abstracts for all symposium events is 18 January 2010.